PROGRAMME (with presentations)

pdf fileDownload the programme (pdf)

 

 

Tuesday, Feb. 26, 2008

9:00 a.m.

Registration starts

10:00 a.m.

Welcome and Introduction to NIST
Mary Saunders (NIST) – Workshop Chair

10:30 a.m.

Workshop expectations and partners’ motivation
Tom Chapin (IEC)
Peter Hatto (ISO)
Rich Kayser (NIST)
Jim Willis (OECD)

11:00 a.m.

Setting the scene
Facilitator: Mary Saunders
Presentations from**:
ASTM: E42, E56
IEC TC 113
IEEE-Nanoelectronic Standards Roadmap (NESR)
SEMI
VAMAS

12:30 p.m.

Lunch

1:30 p.m.

Setting the scene presentations (contd.)
ISO TCs: 24/SC4 (Powers, Stintz, Sem), 146, 194, 201, 209, 213, 229, ISO REMCO
OECD-Working Party on Manufactured Nanomaterials (WPMN) – SG3, SG4, SG7 and SG8

3:15 p.m.

Break

3:30 p.m.

Moderated discussion: The development of documentary standards for the measurement and characterization of nanotechnologies - Metrology needs and gaps: perspectives from national metrology institutes**
Facilitator: Alan Steele (NRCC, Canada)
Presentations: NPL UK, IRMM-JRC, NRCC

5:00 p.m.

Review of information gleaned from scene-setting presentations

5:30 p.m.

Adjourn

 

Wednesday, Feb. 27, 2008

9:00 a.m.

Day 1 recap
Mary Saunders

9:05 a.m.

Instructions for break-out session 1

9:10 a.m.

Breakout session 1:
Identifying Documentary Standards Needs: Fundamental property characterization (e.g., physical, chemical and structural)
Four smaller groups addressing the same issue
(Group members will be pre-selected to ensure a mix of participants in each group)
Facilitators:
Kamal Hossain (NPL, UK)
Harald Bosse (PTB, Germany)
Alan Rawle (ASTM E56)
Peter Hatto (ISO/TC 229)

10:30 a.m.

Break

10:45 a.m.

Breakout session 1 (contd.)

12:00 p.m.

Lunch

1:00 p.m.

Outcomes from breakout session 1
Brief (5-7 minute) presentations from facilitators highlighting needs identified by break-out groups
Facilitator: Mary Saunders (summary)
Reports: Bosse, Hatto, Hossain, Rawle

1:30 p.m.

Breakout sessions 2 to 5:
Identifying Documentary Standards Needs: Nanomaterials in:

  1. Human health and medicine: Scott McNeil (ASTM E56 and NIH, USA) and Laurie Locascio (NIST, USA)
  2. Environment: OECD
  3. Electronics IEEE/SEMI: Jonathan Tucker (IEEE ), Evelyn Hirt (IEEE ), Robert Scace (SEMI)
  4. Materials applications: Steve Freiman (VAMAS ) and Shingo Ichimura (ISO/TC 229)

Breakout sessions will be structured based on how participants prioritize interests in these sessions

3:30 p.m.

Break

3:45 p.m.

Breakout sessions 2 to 5 (contd.)

5 p.m.

Adjourn

 

Thursday, Feb. 28, 2008

9:00 a.m.

Reports from facilitators of breakout sessions 2-5
(10 minute presentation + 10 minute discussions for each)
Facilitator: Mary Saunders

10:15 a.m.

Break

10:30 a.m.

Prioritization of identified needs and means to achieve these
Facilitators: Peter Hatto and Ajit Jilla (NIST)

12:00 p.m.

Lunch

1:00 p.m.

Identifying mechanisms for cooperation and coordination
Facilitator: Mary Saunders

2:00 p.m.

Summary, action items and next steps
Mary Saunders


2:30 p.m.

Adjourn

Notes:
** See appendix for standards development committee and international metrology laboratory listing

 

Appendix

ASTM E42: Surface Analysis
ASTM E56: Nanotechnology
IEC TC113: Nanotechnology standardization for electrical and electronic products and systems
ISO TC24/SC4: Sizing methods other than sieving
ISO TC 146: Air quality
ISO TC201: Surface chemical analysis
ISO TC202: Microbeam analysis
ISO TC209: Cleanrooms and associated controlled enviornments
ISO TC213: Dimensional and geometrical product specifications and verifications
ISO TC229: Nanotechnologies
ISO REMCO: Committee for Reference Materials
OECD WPMN SG3: Safety Testing of a Representative Set of Manufactured Nanomaterials
OECD WPMN SG4: Manufactured Nanomaterials and Test Guidelines
OECD WPMN SG7: The Role of Alternative Methods in Nano Toxicology
OECD WPMN SG8: Exposure Measurement and Exposure Mitigation

Participating metrology laboratories:

Canada: National Research Council of Canada (NRCC)
European Commission: Metrology Institute of the European Commission (IRMM)
France: Laboratoire National de Metrologie et D’Essais (LNE)
Germany: Physikalisch-Technische Bundesanstalt (PTB)
India: National Physical Laboratory (NPL)
Japan: National Institute of Advanced Industrial Science and Technology (AIST)
Korea: Korea Research Institute of Standards and Science (KRISS)
South Africa: National Metrology Institute (NMISA)
Taiwan: Industrial Technology Research Institute (ITRI)
UK: National Physical Laboratory (NPL)
USA: National Institute of Standards and Technology (NIST)